منابع مشابه
Competent Workplace Mathematics: How Signs Become Transparent
Many scientists, asked to interpret unfamiliar graphs that have nevertheless been culled from introductory undergraduate courses in their own field, experience problems and cannot give the standard answer accepted in the field. At the same time, these same scientists turn out to be highly competent when it comes to graphs from their immediate domain of research. In fact, scientists no longer se...
متن کاملSpin Coating of Photoresists
During spincoating, the centrifugal force of the substrate spinning with several 1.000 rounds per minute (rpm) distributes few ml of resist over the substrate. Advantages: The high resist film thickness homogeneity as well as the short coating times make spincoating the most-applied coating technique at least in microelectronics. The fact that the coated resist already lost a significant amount...
متن کاملExposure of Photoresists
Mask-Aligner and Stepper The typical emission spectrum of a mask aligner or stepper with Hg light source and without optical selective mirrors/filters contains g(wavelength 436 nm), h(405 nm) and i-line (365 nm), with an i-line intensity approx. 40 % of the total emission between 440 and 340 nm. The absorption spectrum (spectral sensitivity see next section) of AZ® and TI photoresists is matche...
متن کاملExposure of Photoresists
Mask-Aligner and Stepper The typical emission spectrum of a mask aligner or stepper with Hg light source and without optical selective mirrors/filters contains g(wavelength 436 nm), h(405 nm) and i-line (365 nm) (fig. right-hand), with an iline intensity approx. 40 % of the total emission between 440 and 340 nm. The absorption spectrum (spectral sensitivity see next section) of AZ® and TI photo...
متن کاملPositive Photoresists - Exposure
There are a large number of materials, both organic and inorganic, which are sensitive to light (see, for example, Ref. 1). However, over the years one specific class of photosensitive materials has been dominate in the application of integrated circuit manufacturing -the diazonaphthoquinone/novolak system found in conventional g-line and i-line positive photoresists. Rather than present a comp...
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ژورنال
عنوان ژورنال: Materials Today
سال: 2010
ISSN: 1369-7021
DOI: 10.1016/s1369-7021(10)70191-7